NIST’s Nanostructure Fabrication and Measurement Group has developed advanced electron-beam lithography techniques to create precise nanostructures for various applications. Their Nanolithography Toolbox software allows users to design complex nanoscale devices through scripting, with over 3,500 downloads and use by major companies like 3M, Google X, and Roche.
The group has successfully fabricated GaAs nanophotonic structures that efficiently launch single photons from InAs quantum dots into silicon photonic circuits. This achievement is crucial for developing large-scale quantum systems.
Nanophotonic structures enable precise control of light-matter interactions, allowing observation and application of various optical phenomena on chip. The group’s electron-beam lithography capabilities enable reproducible fabrication of such structures, essential for device development cycles.
In collaboration with F. Hoffmann-La Roche Ltd., the group has developed Pt/Al2O3/Pt junctions with nanopores patterned by electron-beam lithography for biomolecular detection. These devices can detect single molecules by analyzing tunneling currents as biomolecules translocate through nanopores.
Source: https://www.nist.gov/programs-projects/electron-beam-lithography
Keywords: photonic, nanoscale, nanophotonic, lithography, quantum
