Index of Semiconductor Process Gases – Hexafluoroethane | NIST

Summary of Hexafluoroethane Thermophysical Properties Database

The National Institute of Standards and Technology (NIST) has released a comprehensive database of hexafluoroethane (C2F6) thermophysical properties. The database includes precise measurements of key properties such as molecular weight, boiling point, critical constants, and thermal conductivity across a wide temperature range from 170 K to 1000 K.

The database provides:
– Detailed boiling point data with heat capacity ratios
– Vapor pressure measurements
– Thermal conductivity and dynamic viscosity values
– Critical pressure, temperature, and volume constants

Measurement uncertainties are specified for each data point, with estimated uncertainties of 1%/+0.1% for calculated gas densities and ±10%/+0.5% for reference values. The database includes both calculated and estimated values, clearly marked for easy reference.

This extensive dataset will be valuable for semiconductor manufacturing applications, where precise control of gas behavior is critical for process optimization and equipment design. The detailed temperature-dependent properties will help engineers and researchers better understand and model hexafluoroethane’s behavior in various industrial applications.

Source: https://www.nist.gov/pml/sensor-science/fluid-metrology/database-thermophysical-properties-gases-used-semiconductor-10

Keywords: Thermal Conductivity, Dynamic Viscosity, Boiling Point

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