The National Institute of Standards and Technology (NIST) is developing advanced nanoelectromagnetics metrology to support the next generation of nanoscale devices. The program focuses on establishing precise measurement techniques for characterizing materials and devices at the nanoscale, with applications in electronics, spintronics, and life sciences.
Key developments include:
– Near-field Scanning Microwave Microscopy (NSMM) for nanoscale characterization
– Spatially resolved metrology with sub-micrometer resolution
– Applications in perovskite thin films, 2D MoS2 devices, and YIG elements
The program aims to provide metrological tools for the electronics industry to evaluate and develop high-frequency device paradigms. Over the next 5-10 years, NIST researchers expect to make significant impacts in electronics beyond CMOS and clarify measurement needs for industry.
Implementation of these advanced metrology techniques could enable new functionalities beyond conventional electronics, with potential immense impacts on the electronics industry.
Source: https://www.nist.gov/programs-projects/nanoelectromagnetics
Keywords: Metrology, Nanoscale, Microwave, Scanning Probe Microscopy, Nanoscale
