The FCMN conference series focuses on the latest advancements in semiconductor characterization and metrology. The conference brings together developers, researchers, engineers, and scientists to discuss innovative techniques for in-situ, real-time monitoring and control of nanoelectronic materials and devices. Topics covered include chemical, physical, electrical, magnetic, and optical approaches. The conference provides a comprehensive overview of major issues and critical reviews of essential semiconductor techniques for silicon nanoelectronics and beyond. Attendees gain valuable insights into cutting-edge techniques for advancing semiconductor research, development, and manufacturing.
Source: https://www.nist.gov/pml/fcmn-publications-and-talks
Keywords: Metrology, Characterization, Real-time Monitoring
