NIST is working on a project to improve high-frequency transistor modeling and characterization for US semiconductor companies. The project aims to address current limitations in measurement techniques and model accuracy, which are hindering the development of advanced semiconductor technologies.
Key points:
– NIST will analyze existing transistor models, incorporate fabrication process variations, and validate models on realized circuits
– Challenges include inaccurate on-wafer calibration, limited characterization instrumentation, and model inaccuracies at high frequencies
– Improved measurement techniques and models will benefit emerging applications like IoT, high-speed communication, defense systems, and satellite internet
– The project is part of NIST’s CHIPS for America Metrology Program, aiming to provide US semiconductor companies with modernized characterization techniques
The project’s success could lead to more accurate transistor models, better manufacturing quality control, and cost-effective circuit design improvements, ultimately benefiting consumers through improved device performance and reliability.
Source: https://www.nist.gov/programs-projects/rf-metrology-high-frequency-transistor-models
Keywords: Quantum, Critical Components, Manufacturing
