Researchers from NIST, IBM, and MIT have developed a new technique to measure the magnetic properties of thin film edges, which are becoming increasingly important as electronic components shrink in size. The technique uses microwaves to probe the magnetic resonances of nickel-iron alloy stripes patterned on a silicon disk, allowing researchers to distinguish between edge and center magnetic behaviors. The study found that the magnetic properties of the thin film edge are influenced by the film’s thickness and the patterning process. Data from this research will help predict the behavior of nanoscale structures, which are crucial for the development of future nanoscale electronics.
Source: https://www.nist.gov/news-events/news/2007/09/measurements-edge-magnetic-properties-thin-films
Keywords: Thin Films, Magnetic Properties, Nanoscale Electronics, Microwaves, Spectroscopic Technique
