NIST has developed a new “hybrid metrology” method that combines multiple measurement techniques to more accurately measure tiny features on computer chips. The method, which uses statistical analysis to combine data from atomic force microscopy (AFM), scatterometry and other tools, can reduce measurement uncertainties by more than a factor of three.
The new approach is particularly important for measuring complex three-dimensional transistors that are 16 nanometers or smaller in size. By incorporating a few key measured values from other tools into a statistical model, the method can produce more precise measurements than any single technique alone.
Industry has already begun adopting the hybrid metrology method, with companies like IBM and GLOBALFOUNDRIES improving their measurements using this approach. The technique is expected to be essential for future chip manufacturing as feature sizes continue to shrink.
Keywords: nanometer, measurement, uncertainty, precision, metrology
