Advancing PEEM-based Metrology | NIST

NIST researchers are advancing photoemission electron microscope (PEEM) technology to better understand emergent materials and quantum devices. PEEM provides high-resolution imaging of surfaces and electronic properties, filling a gap between bulk-sensitive measurements and atomic-scale scanning probe techniques.

Key improvements include:
– Coupling PEEM with novel laser-based photon sources
– Expanding measurement modalities like electron dynamics and polarization response
– Achieving higher spatial resolution and energy resolution
– Adding in-situ heating and cooling capabilities

These advancements will help researchers better understand the relationship between microstructure and electronic properties in novel materials and devices, ultimately advancing quantum technologies and nanoscale electronics.

Source: https://www.nist.gov/programs-projects/advancing-peem-based-metrology

Keywords: Metrology, Imaging, Photon, Electron, Resolution

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