Researchers at NIST have discovered that photoresists used in next-generation semiconductor manufacturing processes are twice as sensitive to extreme ultraviolet (EUV) light as previously believed. This finding, which could impact future semiconductor manufacturing, was confirmed using a NIST-calibrated photodetector at the Advanced Light Source at Lawrence Berkeley National Laboratory.
EUV lithography is a critical process in semiconductor manufacturing, using light with wavelengths around 13.5 nanometers to create increasingly smaller circuit features. The discovery of higher photoresist sensitivity suggests that less EUV light energy reaches the wafer than previously thought.
The implications of this finding are significant for the semiconductor industry, which is working to implement EUV lithography in high-volume manufacturing by 2012. NIST researcher Steve Grantham emphasizes the need for accurate dose metrology and traceable standards to ensure proper evaluation of source and lithography tool performance.
Source: https://www.nist.gov/news-events/news/2008/06/exposing-sensitivity-extreme-ultraviolet-photoresists
Keywords: Quantum algorithms, Quantum computing, Quantum devices
