Title: NIST Acquires Advanced Annealing System for NanoFab
The National Institute of Standards and Technology (NIST) has recently acquired an AnnealSys AS-Master rapid thermal annealing (RTA) system for its NanoFab cleanroom facility. This state-of-the-art tool is designed to perform automated single-wafer annealing processes for various semiconductor manufacturing applications.
Key features of the AnnealSys AS-Master system include:
– Supports annealing processes for implantation, ohmic contacts, rapid thermal oxidation, and general densification
– Accommodates wafer sizes from 75 mm to 200 mm in diameter
– Capable of high-temperature annealing up to 1500°C
The acquisition of this advanced annealing system will enhance NIST’s capabilities in researching and developing next-generation semiconductor technologies, particularly in the areas of quantum computing and advanced electronics. The tool’s ability to perform precise and efficient annealing processes will be crucial for optimizing the performance of nanoscale devices and materials.
Source: https://www.nist.gov/laboratories/tools-instruments/nanofab-tool-annealsys-rta
Keywords: equipment, annealing, temperature
